2010/02 Systematic and Random Defect Control with Design Based Metrology Hyunjo Yang他 SPIE2010
2009/08 Tolerance-Based Wafer Verification Methodologies with a Die-to-Database Inspection System Kohji Hashimoto他 Japanese Journal of Applied Physics
2009/04 Novel Mask-Qualification Methodology with Die-to-Database Wafer Inspection System Yoshinori Hagio他 Photomask Japan 2009
2009/02 Hotspot Management for Spacer Patterning Technology with Die-to-Database Wafer Inspection System Yoshinori Hagio他 SPIE2009
2009/02 Systematic Defect Filtering and Data Analysis Methodology for Design Based Metrology Hyunjo Yang他 SPIE2009
2008/11 The APC (Advanced Process Control) Procedure for Process Window and CDU improvement using DBMs Jungchan Kim他 SPIE Lithography Asia 2008
2008/11 CD uniformity improvement of sub 60nm contact hole using model based OPC Hyoung-Soon Yune他 SPIE Lithography Asia 2008
2008/11 Novel process proximity correction by the pattern-to-pattern matching method withDBM Daejin Park他 SPIE Lithography Asia 2008
2008/02 Hot Spot Management with Die-to-Database Wafer Inspection System Kohji Hashimoto他 SPIE 2008
2008/02 Systematic Defect Inspection and Verification for Distributions of Critical Dimension in OPC Models Utilizing Design Based Metrology Tool Jeong-Geun Park他 SPIE 2008
2008/02 Wide Applications of Design Based Metrology with Tool Integration Hyunjo Yang他 SPIE 2008
2008/02 A New Robust Process Window Qualification (PWQ) Technique to Perform Systematic Defect Characterization to Enlarge the Lithographic Process Window, using a Die-to-Database Verification Tool (NGR2100). Tadashi Kitamura他 SPIE 2008
2007/11 Die-to-database verification tool using mass gate measurement and Layout Information for detecting critical dimension errors T. Hasebe他 LSI Testing Symposium2007
2007/09 Accuracy of Mask Pattern Contour Extraction with Fine-pixel SEM Images Shinji Yamaguchi他 BACUS
2007/04 A SEM-based System for Photomask Placement Metrology Max Lau他 Photomask Japan 2007
2007/02 Lithography Beyond 32nm: A Role for Imprint? Mark Melliar-Smith他 SPIE2007
2007/02 Die-to-Database Verification Tool for detecting CD errors, which are caused by OPC Features, by using Mass Gate Measurement and Layout Information Tadashi Kitamura他 SPIE2007
2007/02 Advanced Process Control with Design Based Metrology H. Yang他 SPIE2007
2007/02 OPC and Design Verification for DFM JC. Kim他 SPIE2007
2007/02 DFM flow by using combination between design base metrology system and model-base verification at sub-50-nm memory device C. Kim他 SPIE2007
2006/09 Direct Die to Database Electron Beam Inspection of Fused Silica Imprint Templates M. Tsuneoka他 BACUS
2006/09 Introduction of a Die-to-Database Verification Tool for Mask Geometry NGR4000 Michael J. Hoffman他 BACUS
2006/07 Step and Flash Imprint for Silicon Integrated Circuit Applications Mark Melliar-Smith他 NGL2006
2006/07 Wafer and mask inspection methods in which layout data and image acquired by scanning electron microscopes are used Tadashi Kitamura他 NGL2006
2006/02 New OPC Verification Method using Die-to-Database Inspection Hyunjo Yang他 SPIE2006
2006/02 Defect Inspection for Imprint Lithography Using a Die to Database Electron Beam Verification System L. Jeff Myron他 SPIE2006
2006/02 A template infrastructure for step-and-flash imprint lithography
The templates needed for 1× step-and-flash imprint lithography can be fabricated using extensions of current optical mask manufacturing technology.
Douglas J. Resnick他 Microlithography World Feb 2006
2005/12 Template Advances in Step and Flash Imprint Lithography Douglas J. Resnick他 SEMICON Japan2005
2005/11 Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100 Tadashi Kitamura他 LSI Testing Symposium2005
2005/10 Defect inspection of imprinted patterns using a die to database electron beam verification system D. J. Resnick他 The 4th International Nanoimprint and Nanoprint Technology Conference2005
2005/05 Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100 for DFM Tadashi Kitamura他 Photomask Japan2005
2005/04 Introduction of a Die-to-Database Verification Tool for the Entire Printed Geometry of a Die --- Geometry Verification System NGR2100 for DFM Tadashi Kitamura他 SPIE2005
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